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Special Seminar - Current Crowding and Constriction Resistance by Dr. Peng Zhang
Thursday, April 11, 2013
1:00 p.m.-2:30 p.m.
2460 AV Williams
For More Information:
Jasmine Cooper
301 405 3114
cooperj@umd.edu
Because of the surface roughness on a microscopic scale, true contact between two pieces of conductors occurs only at the asperities (small protrusions) of the two contacting surfaces, leading to contact resistance, an important issue to high power microwave sources, wire-array Z pinches, metal-insulator-vacuum junctions, pulsed power systems, field emitters, thin film devices and integrated circuits, and interconnects, etc. Contact problems account for 40 percent of all electrical/electronic failures, ranging from small scale consumer electronic devices to large scale military and aerospace systems.
This talk features recent advances on the modeling of electrical contact resistance for both bulk contacts and thin film contacts. Scaling laws are constructed for a large range of resistivity ratios and geometrical aspect ratios in the contact members, and for arbitrary terminal voltages in a 3-terminal device. Current crowding and current partitions in different regions are displayed. The theory is extended to a contact spot of arbitrary geometry, and to the bulk contact resistance under AC condition. Issues in experimental measurements of constriction resistance are addressed.
This Event is For: Clark School • Graduate • Undergraduate • Faculty • Staff
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